Research Equipment ( co)funded by the Slovenian Research Agency .
Contact or responsible person / kontaktna in odgovorna oseba:
Name and Surname / Ime in priimek: Danilo Vrtačnik Department / Oddelek: Laboratory of microsensor structures and electronics (LMSE) Laboratorij za mikrosenzorske strukture in elektroniko (LMSE) Tel:+386 1 4768303 E-mail / E-pošta: danilo.vrtacnik@fe.uni-lj.si
Spectroscopic ellipsometer SpecEL-2000-VIS
Characterization of transparent thin films (thickness, refractive index).The equipment is installed in clean room environment and is accessible also to other research institutions.
Use of the ellipsometer for an experienced user is €89,18 per hour.
Elipsometrični merilnik tankih plasti SpecEL-2000-VIS
Karakterizacija (debeline, lomni količnik) tankoplastnih transparentnih filmov. Oprema je nameščena v čistih prostorih in je pod ustreznimi pogoji dostopna tudi drugim raziskovalnim organizacijam
Cena uporabe merilnika za izkušenega uporabnika znaša 89,18 €/uro.
ElipsometerSystem for production of ultra pure dionized water (UPW)
System for laboratory production of dionized water used in microelectronic processing. Complies with E2 standard. System is permanently installed and connected to the closed supply loop of cleanroom facility. Deionized water as a product of the system is available to other institutions
use of the UPW for an experienced user is €87,42 per hour.
Sistem za pridobivanje ultra čiste vode (UPW)
Sistem je namenjen pridobivanju izredno čiste deionizirane vode za potrebe mikroelektronskih procesov. Ustreza standardu E2. Sistem je fiksno postavljen in vključen v distribucijsko zanko čistih prostorov. Produkt, DI voda je zato dostopen pod omejenimi pogoji zainteresiranim partnerjem.
Cena uporabe UPW za izkušenega uporabnika znaša 87,42 €/uro.
DI_vodaDedicated wet station for chemical processing of substrates
The equipment is used for chemical cleaning and rinsing of samples in the manufacturing processes of semiconductor elements, which require the use of clean surfaces, such as, for e.g., before the implementation of high-temperature, plasma and other technological processes. The device contains a rinser for quick removal of impurities (QDR) and a control unit with a water resistance meter, which enables automatic and controlled cleaning of samples. The rinser allows simultaneous cleaning of 25 100 mm silicon wafers in standard wafer carrier.
use of the UPW for an experienced user is €83,04 per hour.
Namenska mokra postaja za kemijsko procesiranje substratov
Oprema se uporablja za kemijska čiščenja in spiranja vzorcev v postopkih izdelave polprevodniških elementov, ki zahtevajo uporabo čistih površin, kot je na primer pred izvajanjem visokotemperaturnih, plazemskih in ostalih tehnoloških procesov. Naprava vsebuje izplakovalnik za hitro odstranjevanje čistoč (ang. QDR) in kontrolno enoto z merilnikom upornosti vode, ki omogoča avtomatsko in kontrolirano čiščenje vzorcev. Izplakovalnik omogoča istočasno očistiti 25 silicijevih ploščic velikosti 100 mm v standardni nosilcih.
Cena uporabe UPW za izkušenega uporabnika znaša 83,04 €/uro.
QDR sistem paket 21Desktop direct-write optical lithography system for rapid fabrication of micro/nano structures and elements without a mask
The MicroWriter ML3 Baby is a compact direct-write optical lithography system designed for high-precision fabrication of micro- and nanostructures on photosensitive materials. It features a high-resolution motorized stage capable of patterning areas up to 100 mm x 100 mm. Utilizing an advanced laser writing engine with resolutions down to 0.6 µm, it eliminates the need for traditional photomasks by enabling direct pattern exposure via intuitive software control. The system supports rapid substrate exchange across a variety of sizes and thicknesses and includes an integrated optical camera for real-time alignment and quality control.
use of the UPW for an experienced user is €183,00 per hour.
Namizni sistem za direktno optično litografijo za hitro izdelavo mikro/nano struktur in elementov brez maske
MicroWriter ML3 Baby je kompaktni sistem za direktno optično litografijo, zasnovan za natančno izdelavo mikro- in nanostruktur na svetlobno občutljivih materialih. Opremljen je z motorizirano pozicionirno mizo visoke ločljivosti, ki omogoča zapis vzorcev na področju do 100 mm x 100 mm. Uporablja napreden laserski sistem z ločljivostjo do 0,6 µm in programsko opremo za avtomatizirano izpostavljanje mask ali posameznih vzorcev brez potrebe po klasičnih fotomaskah. Sistem omogoča hitro menjavo substratov različnih dimenzij in debelin ter vključuje integrirano optično kamero za poravnavo in kontrolo kakovosti v realnem času.