|
|
Material and device characterization
Electrical characterization
- HP 4145 B Semiconductor Parametric Analyzer
- HP 4284A Precision LCR meter
- HP 4140 B pA - meter, DC voltage source
- HP 4280 A 1MHz C - meter, CV plotter + Mercury Probe Hg-401RL
- HP 3457A Multimeter
- Wentworth AWP 1050 Automatic Wafer Prober with TEMPTRONIC termochuck TP 0315A-TS-2 - HP PC with IEEE controller interface card
|
| Instruments for electrical characterization |
|
|
| Devices electrical characterization |
|
Optical and mechanical characterization
- PHILTEC cross-sectioner for characterization of diffused layers
- Atcor APC-1000 Air-born Particle Counter , sensitivity 0.3 - 5.0 µm particles
- OLYMPUS optical microscopes: magn. 50-1000x, backlight, dark-field
- Taylor-Hobson Talysurf Surface Profiler for measuring thin film thickness and roughness, range 10nm-4mm, resolution 10nm, travel length 0,5-120mm, scan speed 0,5mm/s, applied force on the stylus 0,7-1mN
- Workbench for process parameter measurements and characterizati
- LEITZ Ergolux for critical dimensions measurements (resolution 10nm)
|
| LEITZ Ergolux |
|
- Sheet resistivity prober: VEECO 4 point measurement AIT CMT-SR2000N automatic 4-point resistivity prober (wafers up to 200mm, range 1mohm/sq - 2Mohm/sq, 10µohmcm - 200KOhmcm, current source 10nA-100mA, accuracy 0,5%)
|
| VEECO AIT CMT-SR2000N |
|
- Spectroscopic ellipsometer SpecEL-2000-VIS, mikropack (thin film thickness and refractive index measurements, HeNe 1mW laser, angles 70°, 50° in 30°, range 0-6000nm, accuracy ± 0,3nm)
|
| SpecEL-2000-VIS |
|
- Olympus Confocal Laser Scanning Microscope LEXT OLS 3000
|
| LEXT OLS 3000 |
|
- pH Meter Metrom 780 (automatic stirrer control, a multi-point calibration with up to nine buffers, a method memory and various monitoring functions)
|
| pH meter Metrom 780 |
|
- Platform for testing of microfluidic chips
|
| -Multichannel pressure controller OB1 MK3+ MUX flow switch matrices MUX Quake valve switch matrices MFS flow sensors |
|
| |