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Laboratory of Microsensor Structures and Electronics
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Faculty of Electrical Engineering
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Physics & device modelling
Semiconductor & MEMS technologies
•Photolithography
•Diffusion & oxidation
•Wet etching & wafer cleaning
•Thin film deposition & etching
Material and device characterization
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Physical Vapor Deposition
MRC 603 sputtering system
  • RF sputtering mode
  • Target configuration
    • Al - Si 1% (purity 99,999) magnetron inset target
    • Ag (99,995) magnetron inset target
    • Ti (99,999) magnetron planar target
    • Ni(V) (99,999) magnetron planar target
MRCina
MRC 603
PVD
PECVD
RIE
DRIE
Surface cleaning

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University of Ljubljana