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Laboratory of Microsensor Structures and Electronics
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Faculty of Electrical Engineering
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Physics & device modelling
Semiconductor & MEMS technologies
•Photolithography
•Diffusion & oxidation
•Wet etching & wafer cleaning
•Thin film deposition & etching
Material and device characterization
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Reactive Ion Etching
Plasmalab μP 80
  • 13.56MHz driven parallel plate reactor
  • substrate electrode: 240mm recessed (3pcs 4" wafers)
  • shower head gas optimised for RIE
  • high conductance vacuum layout
  • water cooled ....
RIE
Plasmalab μP 80

Gases
  • CHF3
  • O2
  • SF6

PVD
PECVD
RIE
DRIE
Surface cleaning

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University of Ljubljana